Customization: | Available |
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After-sales Service: | Free Installing and Training, Technical Support |
Warranty: | One Year |
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Our PECVD (Plasma Enhanced Chemical Vapor Deposition) Coating Equipment is engineered for large flexible substrates, delivering high-performance thin-film coatings with precision and scalability. Designed to meet industrial demands, it ensures uniform deposition of advanced barrier and functional layers for aerospace, flexible electronics, and specialty film applications.
Parameter | Specification |
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Deposition Technology | PECVD |
Substrate Type | Flexible Films (PET, PI, etc.) |
Substrate Width | Up to 1,000 mm |
Vacuum Pressure | ≤1×10-4 Pa |
Coating Uniformity | ±3% |
Film Thickness Range | 10nm - 500nm |
Deposition Speed | Up to 10nm/s |
Substrate Heating | Up to 350°C |
Materials | SiOx, AlOx, Siloxane |
This PECVD coating system delivers scalable, high-precision solutions for coating large flexible substrates, ensuring exceptional film uniformity and throughput. Its advanced control systems, high substrate compatibility, and efficient production processes make it ideal for aerospace applications where precision and reliability are critical.
Elevate your manufacturing processes with SIMVACO's PECVD coating systems for high barrier packing film.